nSI - Current Projects

Currently executed projects include:
 

• the Zeiss-FOM co-funded Industrial Partnership Programme eXtreme UV Multilayer Optics (XMO)

• the SenterNovem funded project Advanced multilayer coatings for high volume EUV lithography (ACHieVE), with partners ASML, Carl Zeiss SMT AG, Philips Extreme UV GmbH, SAGEM, and Media Lario

• FOM Programme 75, named PSI-lab: An integrated laboratory on plasma-surface interaction

• In situ monitoring of contamination layers on EUV optics at Angstrom resolution (ISitCLEAR), a project funded by M2i and ASML

• Photolytic salt formation at oxide surfaces, also by M2i and ASML

• the STW funded project Nano-engineering rules for X-ray and EUV optics: Atomic-scale controlled deposition, executed with the University Leiden

• Dynamic Scaling of Ion-Etched Silicon Surfaces, a short project at the European Synchrotron Radiation Facility (ESRF), with partners at the Institute for Crystallography, Moscow, University Carlos III, Leganes, and ESRF, Grenoble

• XUV Metrology, an STW Valorisation Grant project executed with Scientec Engineering

• Multilayer Optics for Lithography Beyond the Extreme Ultraviolet Wavelength Range, funded by STW and partner Carl Zeiss SMT AG

• Materials for photoconversion, in collaboration with TU Delft