nanolayer Surface & Interface physics (nSI)

The 'nanolayer Surface and Interface Physics' department, or shortly nSI, addresses topics in surface science, and in thin film and multilayer physics, including the numerous interdependencies between these areas. Research involves physical and chemical phenomena at surfaces, in the solid state, as well as XUV optical and plasma physics aspects, with emphasis on the boundary areas between these.

The investigations are motivated by the application of the know-how in advanced photo-lithography optics, plasma surface interaction phenomena as e.g. in thermonuclear fusion processes, and the utilization of multilayer reflective optics for short-wavelength radiation.

The front-line research on these themes at nSI takes advantage of the availability of advanced UHV instrumentation and state-of-the-art experimental facilities. The continuous technological development in this area forms a strong tradition at nSI.

The nSI department consists of three research groups:

• Surface ion- and photochemistry, (or SIPC),

• Physics of thin films and multilayers (TFM), and

• Advanced applications of XUV optics (AXO).

Currently executed projects include:
 

• the Zeiss-FOM co-funded Industrial Partnership Programme eXtreme UV Multilayer Optics (XMO)

• the SenterNovem funded project Advanced multilayer coatings for high volume EUV lithography (ACHieVE), with partners ASML, Carl Zeiss SMT AG, Philips Extreme UV GmbH, SAGEM, and Media Lario

• FOM Programme 75, named PSI-lab: An integrated laboratory on plasma-surface interaction

• In situ monitoring of contamination layers on EUV optics at Angstrom resolution (ISitCLEAR), a project funded by M2i and ASML

• Photolytic salt formation at oxide surfaces, also by M2i and ASML

• the STW funded project Nano-engineering rules for X-ray and EUV optics: Atomic-scale controlled deposition, executed with the University Leiden

• Dynamic Scaling of Ion-Etched Silicon Surfaces, a short project at the European Synchrotron Radiation Facility (ESRF), with partners at the Institute for Crystallography, Moscow, University Carlos III, Leganes, and ESRF, Grenoble

• XUV Metrology, an STW Valorisation Grant project executed with Scientec Engineering

• Multilayer Optics for Lithography Beyond the Extreme Ultraviolet Wavelength Range, funded by STW and partner Carl Zeiss SMT AG

• Materials for photoconversion, in collaboration with TU Delft