PhD-students - Physics and Chemistry of Extreme UV Multilayer Optics

The Foundation for Fundamental Research on Matter (FOM) promotes, coordinates and finances fundamental and applied physics research in the Netherlands. It is an autonomous foundation responsible to the physics division of the national research council NWO. FOM employs about 950 people, primarily scientists (including PhD students) and technicians, who work at FOM research institutes and university laboratories. In addition to the funding of NWO, FOM acquires financial means from industry and the European Union. In the frame of its valorisation policy FOM actively pursues research programmes through partnership with industry and the establishment of FOM research groups in industrial research environments.

PhD-students
Physics and Chemistry of Extreme UV Multilayer Optics

Ultrathin films find a major application in multilayer optics for the reflection of short-wavelength light. Designed for Extreme UV wavelengths, i.e. 13 nanometer, such multilayers have recently enabled the sensational development of a high-resolution lithographic technology for the manufacture of integrated circuits. At the basis of this achievement was forefront fundamental research at FOM on the thin film and solid state physics of such multilayer optics. FOM has now started a new multidisciplinary research programme to study the basic physics and chemistry required for further usage of multilayer optics in lithography, aiming at new classes of EUV-optics. The research will take place at the FOM Institute for Plasma Physics Rijnhuizen (Nieuwegein), and at a new FOM laboratory at the lithography equipment manufacturer ASML (Veldhoven), using its unique EUV radiation and analysis facilities.

Research field

The interaction of high-intensity ion and photon beams with thin film surfaces is a fundamental and fascinating process. It involves both ion- and photon-induced physical reactions as well as photo- and plasma chemistry at the surfaces. The experimental approach will be to isolate the individual processes and to control them at the atomic and molecular level, with support from analytical and numerical methods like Particle-In-Cell plus Monte Carlo. The studies include molecular and particle contamination and new, spectroscopic detection methods.  The scientific programmes at Rijnhuizen and ASML include world-leading research activities in each of these areas, exploiting high flux photon sources and ion beam generators, equipment to study surface photochemistry from the infrared to the extreme UV, atomic-scale layer growth set-ups and surface analysis facilities, state-of-the-art (particle) inspection and diagnostics and a range of numerical tools. The research is done in close collaboration with other industrial and academic parties, including Carl Zeiss SMT, the renowed ISAN Institute (Moscow) and the University of Twente.

Research topics

The available PhD positions include topics such as:

• Particle and molecular contamination on patterned surfaces, involving novel spectroscopy-based techniques for particle inspection of reticles and the study of molecular contamination in the presence of patterns (location ASML).
• Energy dependent surface photochemistry, involving the specific photochemistry of e.g. physisorbed hydrocarbons or water at different photon energies under UHV conditions, including the relative importance of direct photo-induced processes (location ASML).
• Kinetic studies of  EUV-induced plasma chemistry using numerical tools like the Particle-In-Cell plus Monte Carlo method to model plasma generated by a combined action of photo-ionization and surface release of secondary electrons (location FOM).
• Plasma-surface interaction at EUV surfaces, including erosion of surfaces and multilayer structures due to exposure to high ion fluxes, as well as studies on physical sputtering, H-enhanced atom mobility, and chemical surface actvities (location FOM/ASML).
• Layer interface interactions in multilayer EUV mirrors down to the monolayer level, with the aim to identify and control interface processes in ultrathin compounded systems with high optical contrasts (location FOM).
• Modification of the optical response of EUV optics by addressing both the optical as well as the thin film growth aspects, including anti-reflectance coatings, diffractive filtering systems, and multilayers with new optical responses (location FOM).

Qualifications

Applicants should have a Master degree in Experimental or Technical Physics or Chemistry, or an equivalent diploma giving access to doctoral studies. Experience on either surface photochemistry, plasma physics, plasma/ion surface interactions, thin film physics, material science, optics or spectroscopy is an advantage.

Employment Conditions

FOM offers a stimulating work environment in an area of applied, forefront research. When fulfilling a PhD position at FOM, you will get the status of junior scientist. You will have an employment contract for the duration of 4 years and can participate in all the employee benefits FOM offers. The gross monthly salary starts with € 2037,- in the first year and increases to € 2610,- in the fourth year of your employment. The salary is supplemented with a holiday allowance of 8% and an end-of year bonus of 8.33%. A high-quality training programme is part of the agreement. You and your supervisor will make up a plan for the additional education and supervising that you specifically need. The research has to result in a thesis at the end of the four year term with FOM. Depending on the topic, the positions are based at Veldhoven or Nieuwegein; they are available immediately.

Information

Employment conditions are laid down in the 'CAO onderzoekinstellingen' and can be consulted at the FOM website (www.fom.nl under 'Personnel' or 'Personeelsinfo'). General information on working at FOM can also be found at the FOM website. For further information please contact Prof. dr Fred Bijkerk or Drs. Eric Louis on +31 30 6096999, or mail to f [dot] bijkerk [in_the_middle] rijnhuizen [dot] nl or e [dot] louis [in_the_middle] rijnhuizen [dot] nl.

Application

Your letter of application with resume can be sent to drs. Karijn Heling, FOM Institute for Plasma Physics, P.O. Box 1207, 3430 BE Nieuwegein, The Netherlands or by e-mail to: vacancies [in_the_middle] rijnhuizen [dot] nl. Please note vac. no 10/003 in your application letter.

Acquisition to this vacancy is not appreciated